Dry processes are the state-of-the-art technologies leading the way through ultra-high performance in microelectronic devices. This symposium has provided for more than three decades a valuable forum of discussion on science and technology of new developments in this field. The 33rd International Symposium on Dry Process (DPS 2011) will be held at Kyoto Garden Palace, Kyoto, Japan, on November 10–11, 2011.
The DPS committees would like to thank all the presenters, attendees, and exhibitors for their support in this year’s successful DPS.
Submission to JJAP
The DPS 2011 committee would like to invite you to submit your research presented in the DPS 2011 to a special issue of JJAP. For presenters who wish to submit, the deadline for submission has been extended to November 28, 2011. We look forward to your submission.
Recent Updates
- Nov 15: Updates on JJAP submission.
- Nov 8: Information updated. We now have a restaurant map. We are looking forward to welcoming you at Kyoto!
- Oct 26: Technical program posted.
- Oct 5: Timetable updated.
Important dates
- Two-page abstract deadline:
July 12, 2011extended to July 26, 2011 - Reply to acceptance notification by: September 13, 2011
- Final announcement/Program: the end of September, 2011
- Early registration deadline: October 13, 2011
- DPS 2011: November 10–11, 2011
- Deadline for special issue of JJAP: Extended to November 28, 2011
